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Neutron guidance by internal reflections in thin silicon wafers

✍ Scribed by U. Grüning; A. Magerl; D.F.R. Mildner


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
826 KB
Volume
314
Category
Article
ISSN
0168-9002

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We discuss the usefulness of the two-prism coupling geometry to perform non-destructive multiple internal reflection (MIR) measurements on 200 mm silicon wafers. Application to the determination of the Si±H and N±H bond concentrations in LPCVD SiN ultra-thin films, is presented. It is shown that an