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Nanostructured copper–carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

✍ Scribed by Y Pauleau; F Thièry


Book ID
117356982
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
117 KB
Volume
56
Category
Article
ISSN
0167-577X

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