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Nanostructural characterization of TiN-Ni films: A XAFS study

✍ Scribed by F. Pinakidou; M. Katsikini; E.C. Paloura; A. Akbari; J.P. Riviere

Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
174 KB
Volume
176
Category
Article
ISSN
0921-5107

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We report on the modification of the local coordination of Cu in TiN-Cu films, as a function of the growth conditions. The films were deposited on Si (100) by pulsed laser deposition using either an intermetallic TiCu target or elemental Ti and Cu targets. During growth the partial nitrogen pressure