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Nanoscale patterning by focused ion beam enhanced etching for optoelectronic device fabrication

✍ Scribed by S. Rennon; L. Bach; H. König; J.P. Reithmaier; A. Forchel; J.L. Gentner; L. Goldstein

Book ID: 114155264
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 474 KB
Volume: 57-58
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(01)00451-8

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