๐”– Bobbio Scriptorium
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Nanolithography with an atomic force microscope

โœ Scribed by M. Wendel; B. Irmer; J. Cortes; R. Kaiser; H. Lorenz; J.P. Kotthaus; A. Lorke; E. Williams


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
547 KB
Volume
20
Category
Article
ISSN
0749-6036

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The use of an atomic force microscope (AFM) as a nanolithographic tool is demonstrated. A photoresist layer several nanometre thin is indented by the vibrating AFM tip, where software control switches the tapping force from the imaging to the patterning mode. The resist pattern is transferred into a