๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Direct Measurement of the Depletion Force Using an Atomic Force Microscope

โœ Scribed by Andrew Milling; Simon Biggs


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
154 KB
Volume
170
Category
Article
ISSN
0021-9797

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Direct Quantification of Aspergillus nig
โœ W.Richard Bowen; Robert W. Lovitt; Chris J. Wright ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 100 KB

An atomic force microscope has been used to quantify directly the adhesion between single Aspergillus niger spores and freshly cleaved mica surfaces. The measurements used "spore probes" constructed by immobilizing a single spore at the apex of a tipless AFM cantilever. Adhesion was quantified from

Direct Force Measurement of Comb Silicon
โœ Anfeng Wang; Liping Jiang; Guangzhao Mao; Yihan Liu ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 128 KB

The interaction forces provided by silicone polyether (SPE) surfactants, adsorbed at the interface of octadecyltrichlorosilan monolayer and aqueous surfactant solution, were measured by atomic force microscopy. Changes in the forces in the presence of ethanol were examined for a series of comb-type

Direct Measurement of Depletion and Stru
โœ Martin Piech; John Y. Walz ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 289 KB

The effect of polydispersity in macromolecule size or surface potential on the depletion interaction between a spherical silica particle and a silica flat in solutions containing two different types of nonadsorbing charged spherical macromolecules was studied with an atomic force microscope (AFM). T

Wet-chemical nanoscale patterning of GaA
โœ B. Klehn; S. Skaberna; U. Kunze ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 461 KB

Sub-100 nm V-grooves in GaAs(001) surfaces have been fabricated by patterning a thin photoresist layer with an atomic force microscope (AFM) and subsequent wet-chemical etching. The nanolithography is based on the dynamic ploughing technique. Anisotropic etchants under investigation are bromine-meth