Nano-structure and tribological properties of B+ and Ti+ co-implanted silicon nitride

✍ Scribed by Naoki Nakamura; Katsutoshi Noda; Yukihiko Yamauchi

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 541 KB
• Volume: 227
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2004.09.011

✦ Synopsis

Silicon nitride ceramics have been co-implanted with boron and titanium ions at a fluence of 2 • 10 17 ions/cm 2 and an energy of 200 keV. TEM results indicated that the boron and titanium-implanted layers were amorphized separately and titanium nitride nano-crystallites were formed in the titanium-implanted layer. XPS results indicated that the implantation profile varied a little depending on the ion implantation sequence of boron and titanium ions, with the boron implantation peak shifting to a shallower position when implanted after Ti + -implantation. Wear tests of these ionimplanted materials were carried out using a block-on-ring wear tester under non-lubricated conditions against commercially available silicon nitride materials. The specific wear rate was reduced by ion implantation and showed that the specific wear rate of Ti + -implanted sample was the lowest, followed by B + , Ti + co-implanted and B + -implanted samples.