Nano-modification of surface morphology of Teflon AF with VUV laser light

✍ Scribed by Sarantopoulou, E.

• Book ID: 105364301
• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 429 KB
• Volume: 204
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200675336

✦ Synopsis

Abstract

Processing of Teflon AF surface was made with laser light at 157 nm with nano‐resolution control. Thin films of Teflon AF layers, 0.58 and 2.4 nm thick on the average, were removed following surface etching in nitrogen and vacuum respectively at 1 mJ/cm^2^. AFM imaging and mass spectroscopy, reveals functionalization and smoothing of exposed to light surfaces. Contrary to previous results with different fluoropolymers such as poly(2,2,2‐trifluoroethyl methacrylate), PTFEMA, the surface roughness of Teflon AF was reduced to 4 nm on the average, allowing modification of flow and binding of bio‐materials on Teflon AF. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)