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Multisegmented nanotubes by surface-selective atomic layer deposition

โœ Scribed by Bae, Changdeuck ;Zierold, Robert ;Montero Moreno, Josep M. ;Kim, Hyunchul ;Shin, Hyunjung ;Bachmann, Julien ;Nielsch, Kornelius

Book ID
121372180
Publisher
The Royal Society of Chemistry
Year
2013
Tongue
English
Weight
662 KB
Volume
1
Category
Article
ISSN
2050-7526

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โœ K.-E. Elers; V. Saanila; P. J. Soininen; W.-M. Li; J. T. Kostamo; S. Haukka; J. ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 247 KB

Diffusion barrier materials, TiN and WN, were deposited by atomic layer deposition (ALD). The chlorine concentration of the TiN film was as low as 1.2 at.-%, and resistivity was below 200 lX cm. Ultra high aspect ratio (AR = 85) trenches were used to assess step coverage. Tungsten nitride film, depo