✦ LIBER ✦

Multi-step rapid thermal annealing of boron and indium implanted Hg1−xCdxTe

✍ Scribed by J. A. López-Rubio; J. Sangrador; M. Clement; T. Rodríguez

Book ID: 112811710
Publisher: Springer US
Year: 1994
Tongue: English
Weight: 497 KB
Volume: 23
Category: Article
ISSN: 0361-5235
DOI: 10.1007/bf02649977

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Hg1−xCdxTe: electrical and structural ch

Hg1−xCdxTe: electrical and structural changes induced by rapid thermal annealing

✍ J. Sangrador; J.A. López-Rubio; C. González; T. Rodríguez; C. Uzan-Saguy; E. Oph 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 487 KB

Rapid thermal annealing of arsenic and b

Rapid thermal annealing of arsenic and boron‐implanted silicon

✍ Narayan, J.; Holland, O. W.; Eby, R. E.; Wortman, J. J.; Ozguz, V.; Rozgonyi, G. 📂 Article 📅 1983 🏛 American Institute of Physics 🌐 English ⚖ 532 KB

Effects of rapid thermal annealing on th

Effects of rapid thermal annealing on the electrical properties of Hg1 − xCdxTe bulk crystals

✍ J. A. López Rubio; J. Sangrador; T. Rodríguez 📂 Article 📅 1994 🏛 John Wiley and Sons 🌐 English ⚖ 325 KB

Activation and diffusion during rapid th

Activation and diffusion during rapid thermal annealing of arsenic and boron implanted silicon

✍ J.J. Grob; S. Unamuno; A. Grob; M. Ajaka; A. Slaoui; R. Stuck 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 401 KB

Enhanced diffusion phenomena during rapi

Enhanced diffusion phenomena during rapid thermal annealing of preamorphized boron-implanted silicon

✍ Guimarães, S. ;Landi, E. ;Solmi, S. 📂 Article 📅 1986 🏛 John Wiley and Sons 🌐 English ⚖ 645 KB

Diffusion of boron and arsenic implants

Diffusion of boron and arsenic implants in 〈111〉 and 〈100〉 Si during rapid thermal annealing

✍ R. Kalish; G.S. Oehrlein; V.R. Deline; S.A. Cohen 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 563 KB