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Multi-component material sputtering by hollow cathode discharge

✍ Scribed by V. Gencheva; R. Djulgerova; V. Mihailov; A. Stoyanova-Ivanova; T. Dohnalik


Book ID
105721227
Publisher
Springer
Year
2004
Tongue
English
Weight
226 KB
Volume
54
Category
Article
ISSN
0011-4626

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Sputtering—atomizing and optogalvanic pr
✍ D Zhechev; S Atanassova 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 271 KB

The atomisation and optogalvanic (OG) properties of Ar-Mg a hollow cathode discharge (HCD) plasma are analysed. Under operating conditions of an Ar gas pressure of 39.8 Pa and a discharge current of 10 mA the real sputtering coefficient and the density of the magnesium atoms are calculated to be S k