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Sputtering—atomizing and optogalvanic properties of an Ar–Mg Hollow cathode discharge

✍ Scribed by D Zhechev; S Atanassova


Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
271 KB
Volume
51
Category
Article
ISSN
0042-207X

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✦ Synopsis


The atomisation and optogalvanic (OG) properties of Ar-Mg a hollow cathode discharge (HCD) plasma are analysed. Under operating conditions of an Ar gas pressure of 39.8 Pa and a discharge current of 10 mA the real sputtering coefficient and the density of the magnesium atoms are calculated to be S k = 3×10 -2 atoms per ion and 1.45×10 11 cm -3 respectively. The characteristics and a new point of view of the OG signal from the Ar + ion are discussed.