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MOS measurement of oxygen recoils from As implantation into silicon dioxide

โœ Scribed by Goetzberger, A.; Bartelink, D. J.; McVittie, J. P.; Gibbons, J. F.


Book ID
111933238
Publisher
American Institute of Physics
Year
1976
Tongue
English
Weight
476 KB
Volume
29
Category
Article
ISSN
0003-6951

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