Incorporation of oxygen atoms into As+implanted silicon during cw CO2laser annealing in O2

✍ Scribed by Ian W. Boyd

• Publisher: Springer
• Year: 1983
• Tongue: English
• Weight: 548 KB
• Volume: 31
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/bf00616307