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Morphology of Si-SiO2 interface

✍ Scribed by Takuo Sugano; Jen Jon Chen; Toshihisa Hamano


Publisher
Elsevier Science
Year
1980
Weight
66 KB
Volume
98
Category
Article
ISSN
0167-2584

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Si-rich-SiO 2 layers with excess silicon of 45-50% were grown by RF magnetron co-sputtering from pure SiO 2 and Si targets and were studied by Raman scattering, HRTEM, electron-paramagnetic resonance and X-ray diffraction (XRD) methods as well as by photo-voltage technique operated at different temp