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Morphology of hydrogen-terminated Si(111) and Si(100) surfaces upon etching in HF and buffered-HF solutions

โœ Scribed by P. Dumas; Y.J. Chabal; P. Jakob


Book ID
118365724
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
1011 KB
Volume
269-270
Category
Article
ISSN
0039-6028

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Etching processing of Si(111) and Si(100
โœ Masanori Nakamura; Moon-Bong Song; Masatoki Ito ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 512 KB

situ real-time measurements of etching processes by infrared total reflection spectroscopy were carried out for the first time on Si(ll1) and Si(100) surfaces in ammonium fluoride solution. The absorption bands became broad by the interaction between terminal hydrides with water molecules. On Si(lll