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Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions

✍ Scribed by P. Jakob; Y.J. Chabal; Krishnan Raghavachari; R.S. Becker; A.J. Becker

Book ID: 118365318
Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 737 KB
Volume: 275
Category: Article
ISSN: 0039-6028
DOI: 10.1016/0039-6028(92)90813-l

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