Post deposition UV-induced O2 annealing
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Q. Fang; I. Liaw; M. Modreanu; P.K. Hurley; I.W. Boyd
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Article
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2005
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Elsevier Science
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English
β 115 KB
UV-assisted annealing processes for thin oxide films is an alternative to conventional thermal annealing and has shown many advantages such as low annealing temperature, reducing annealing time and easy to control. We report in this work the deposition of ultra-thin HfO 2 films on silicon substrate