Morphological Instability of High Ge Percent SiGe Films Grown by Ultra-High Vacuum Chemical Vapor Deposition

✍ Scribed by Hart, J.; Hazbun, R.; Nakos, J.; Siegel, D.; Funch, C.; Kolodzey, J.; Harame, D. L.

• Book ID: 127118698
• Publisher: The Electrochemical Society
• Year: 2014
• Tongue: English
• Weight: 370 KB
• Volume: 64
• Category: Article
• ISSN: 1938-6737
• DOI: 10.1149/06406.0659ecst