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Monomeric Titanium(IV) Azides as a New Route to Titanium Nitride

โœ Scribed by Carmalt, Claire J.; Cowley, Alan H.; Culp, Robert D.; Jones, Richard A.; Sun, Yang-Ming; Fitts, Bill; Whaley, Sandra; Roesky, Herbert W.

Book ID
126023001
Publisher
American Chemical Society
Year
1997
Tongue
English
Weight
131 KB
Volume
36
Category
Article
ISSN
0020-1669

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Plasma CVD of high quality titanium nitr
Plasma CVD of high quality titanium nitride using titanium(IV)isopropoxide as precursor
โœ A. Weber; R. Poeckelmann; C.-P. Klages ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 336 KB

High-quality TiN films were deposited in an electron-cyclotron-resonance (ECR) plasma process at low substrate temperatures between 100 and 450ยฐC using titanium(IV)isopropoxide (TIP) {Ti[OCH(CH3)2]4} as a precursor. TIP was introduced into the downstream region of an ECR nitrogen or ammonia plasma.