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Molecular design and development of photoresists for ArF excimer laser lithography

✍ Scribed by Etsuo Hasegawa; Katsumi Maeda; Shigeyuki Iwasa

Publisher: John Wiley and Sons
Year: 2000
Tongue: English
Weight: 277 KB
Volume: 11
Category: Article
ISSN: 1042-7147
DOI: 10.1002/1099-1581(200008/12)11:8/12<560::aid-pat6>3.0.co;2-o

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