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Design and synthesis of new photoresist materials for ArF lithography

✍ Scribed by Hwang-Un Seo; Sung-Ho Jin; Sang-Jun Choi; Yeong-Soon Gal; Kwon Taek Lim

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 184 KB
Volume: 92
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.13701

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