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Modelling of inductively coupled plasma processing reactors

✍ Scribed by Bose, Deepak; Hash, David; Govindan, T R; Meyyappan, M

Book ID: 120487918
Publisher: Institute of Physics
Year: 2001
Tongue: English
Weight: 403 KB
Volume: 34
Category: Article
ISSN: 0022-3727
DOI: 10.1088/0022-3727/34/18/305

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