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Modeling silicon dots fabrication using self-limiting oxidation

โœ Scribed by Yijian Chen; Yishi Chen

Book ID
114155265
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
180 KB
Volume
57-58
Category
Article
ISSN
0167-9317

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## Abstract In this paper we report a new approach to fabricate gated silicon microtip arrays for field emission applications using a single mask process. The key role in the fabrication process is played by the photoelectrochemical etching of silicon in HFโ€based electrolytes. This technique is her