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Modeling of ion beam induced damage in Si during channeling Rutherford backscattering spectrometry analysis

✍ Scribed by Wei Hua; Shu-De Yao; Dharshana Wijesundera; Xue-Mei Wang; Wei-Kan Chu; Michael Martin; Jesse Carter; Mark Hollander; Lin Shao

Book ID: 108224440
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 517 KB
Volume: 267
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2008.12.021

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