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Modeling of effect of interfacial charges on impurity diffusions in silicon-on-sapphire device processing

✍ Scribed by Rios, R.; Rothwarf, A.; Magee, C.W.; Tyson, S.M.

Book ID: 114595658
Publisher: IEEE
Year: 1986
Tongue: English
Weight: 764 KB
Volume: 33
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1986.22657

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