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Modeling and simulation development of electron beam resist based on cellular automata

โœ Scribed by Li Ling; Long Shibing; Wang Congshun; Wu Wengang; Hao Yilong; Liu Ming


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
233 KB
Volume
37
Category
Article
ISSN
0026-2692

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A new method of evaluation of the effect
โœ Z. Pelzbauer; R. Wagner ๐Ÿ“‚ Article ๐Ÿ“… 1984 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 371 KB ๐Ÿ‘ 1 views

## Synopsis .A new method of evaluation of the effect of electron beam on the latent changes in degrading polymer resists has been developed on the base of measurement of the developing curve under an interference microscope. An evaluation procedure using the unit parameters (film thickness and de