✦ LIBER ✦
Three-dimensional development of electron beam exposed resist patterns simulated by using ray tracing model
✍ Scribed by Li Jia; Wang Jian-kun; Wang Shao-jun
- Publisher
- Elsevier Science
- Year
- 1987
- Tongue
- English
- Weight
- 197 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.