𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Model calculations of profiles and dose of high dose ion implants influenced by sputtering

✍ Scribed by H. Kräutle


Publisher
Elsevier Science
Year
1976
Weight
403 KB
Volume
134
Category
Article
ISSN
0029-554X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Properties of oxide and nitride layers i
✍ Shigeo Ohira; Masaya Iwaki 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 652 KB

Recent advances in high dose ion implantation The surface properties such as depth profile, techniques have produced silicon-on-insulator chemical bond and structure, and electrical prop-(SOI) substrates for the fabrication of electronic erties of oxide and nitride layers in aluminium devices. Oxyge