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Model-based analysis of the silica glass film etch mechanism in CF4/O2inductively coupled plasma

✍ Scribed by Mansu Kim; Nam-Ki Min; Alexander Efremov; Hyun Woo Lee; Chi-Sun Park; Kwang-Ho Kwon


Book ID
106397895
Publisher
Springer US
Year
2007
Tongue
English
Weight
371 KB
Volume
19
Category
Article
ISSN
0957-4522

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