Microstructure and mechanical properties of TiAlN/Si3N4 nano-multilayers synthesized by reactive magnetron sputtering
β Scribed by Jianling Yue; Geyang Li
- Book ID
- 116604946
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 398 KB
- Volume
- 481
- Category
- Article
- ISSN
- 0925-8388
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Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si
Motivated by the success of transition metal nanocomposite hard coatings, a new optically transparent coating based on the Al-Si-N ternary system was developed. Al-Si-N thin films were deposited by reactive DC magnetron co-sputtering of Al and Si targets in an Ar/N 2 atmosphere at 200 Β°C and 500 Β°C