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Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition

✍ Scribed by Durand, C.; Dubourdieu, C.; Vallée, C.; Loup, V.; Bonvalot, M.; Joubert, O.; Roussel, H.; Renault, O.


Book ID
120794142
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
460 KB
Volume
96
Category
Article
ISSN
0021-8979

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