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The interface formation and adhesion of metals (Cu, Ta, and Ti) and low dielectric constant polymer-like organic thin films deposited by plasma-enhanced chemical vapor deposition using para-xylene precursor

✍ Scribed by K.S. Kim; Y.C. Jang; H.J. Kim; Y.-C. Quan; J. Choi; D. Jung; N.-E. Lee


Book ID
114085320
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
330 KB
Volume
377-378
Category
Article
ISSN
0040-6090

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