𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Microstructural characterization of N, Ti mixed coatings deposited by plasma based ion implantation and magnetron sputtering deposition

✍ Scribed by Xinxin Ma; Renchao Che; Mingren Sun; Yue Sun; Lifang Xia; Xiaodong Li


Book ID
110241238
Publisher
Springer
Year
2000
Tongue
English
Weight
409 KB
Volume
19
Category
Article
ISSN
0261-8028

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Microstructure and mechanical properties
✍ A. PΓ©lisson; M. Parlinska-Wojtan; H.J. Hug; J. Patscheider πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 859 KB

Motivated by the success of transition metal nanocomposite hard coatings, a new optically transparent coating based on the Al-Si-N ternary system was developed. Al-Si-N thin films were deposited by reactive DC magnetron co-sputtering of Al and Si targets in an Ar/N 2 atmosphere at 200 Β°C and 500 Β°C

Physics of plasma-based ion implantation
✍ Anders, AndrΓ© πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 431 KB

## Abstract The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma‐Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma‐sheath sys