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Microstructural characterisation of TiAl thin films grown by DC magnetron co-sputtering technique

✍ Scribed by C Padmaprabu; P Kuppusami; A.L.E Terrance; E Mohandas; V.S Raghunathan; Sangam Banerjee; Milan K Sanyal

No coin nor oath required. For personal study only.

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