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Microstructural analysis of nickel silicide formed by nickel/silicon‐on‐oxide annealing

✍ Scribed by Yang, H.; Pinizzotto, R. F.; Luo, L.; Namavar, F.

Book ID: 118733874
Publisher: American Institute of Physics
Year: 1993
Tongue: English
Weight: 731 KB
Volume: 62
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.109234

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