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Methyl Concentration Measurements During Microwave Plasma-Assisted Diamond Deposition

✍ Scribed by M. A. Cappelli; T. G. Owano; A. Gicquel; X. Duten

Book ID: 110244938
Publisher: Springer
Year: 2000
Tongue: English
Weight: 132 KB
Volume: 20
Category: Article
ISSN: 0272-4324
DOI: 10.1023/a:1006985925431

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