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Method for producing via-connections in semiconductor wafers using a combination of plasma and chemical etching

✍ Scribed by Guldan, A.; Hrubcin, L.; Kubek, J.; Tykva, R.

Book ID: 114594523
Publisher: IEEE
Year: 1983
Tongue: English
Weight: 347 KB
Volume: 30
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1983.21307

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