Low-temperature chemical vapor depositio
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Hideaki Zama; Shunri Oda; Takayuki Miyake; Takeo Hattori
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Article
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1991
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Elsevier Science
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English
โ 197 KB
Low-temperature growth of YBa2Cu30 x films by CVD has been investigated using Y(DPM) 3, Ba(DPM)? and Cu(DPM) o as starting materials and N20 as an oxidizing agent. 123-perovskite structure ha~ been prepared at a substrate temperature of 530 C, Superconducting films with zero-resistivity T\_ of 15K