Low-temperature chemical vapor deposition of YBa2Cu3Ox films

✍ Scribed by Hideaki Zama; Shunri Oda; Takayuki Miyake; Takeo Hattori

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 197 KB
• Volume: 185-189
• Category: Article
• ISSN: 0921-4534
• DOI: 10.1016/0921-4534(91)91176-5

✦ Synopsis

Low-temperature growth of YBa2Cu30 x films by CVD has been investigated using Y(DPM) 3, Ba(DPM)? and Cu(DPM) o as starting materials and N20 as an oxidizing agent. 123-perovskite structure ha~

been prepared at a substrate temperature of 530 C, Superconducting films with zero-resistivity T_ of 15K and Tonset=87K has been obtained at Tsub=610°C and Tc=83K, Tonset.~89K at Tsub=650°C. A 2~4nm-li2ht has promoted decomposition of B-diketonate complex at Tsub=215~C.