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Medium energy ion scattering for the characterisation of damage profiles of ultra shallow B implants in Si

✍ Scribed by J.A van den Berg; S Zhang; S Whelan; D.G Armour; R.D Goldberg; P Bailey; T.C.Q Noakes

Book ID: 114164613
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 715 KB
Volume: 183
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(00)00683-2

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