Characterization of dopant profiles produced by ultra-shallow As implantation and spike annealing using medium energy ion scattering

✍ Scribed by S. Ichihara; T. Nakagawa; M. Nitta; S. Abo; T. Lohner; C. Angelov; K. Ohta; M. Takai

• Book ID: 113822951
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 326 KB
• Volume: 219-220
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2004.01.124