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Mechanisms of changes of hole concentration in Al-doped 6H-SiC by electron irradiation and annealing

✍ Scribed by Hideharu Matsuura; Hideki Yanagisawa; Kozo Nishino; Yoshiko Myojin; Takunori Nojiri; Yukei Matsuyama; Takeshi Ohshima


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
250 KB
Volume
404
Category
Article
ISSN
0921-4526

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From the temperature dependence of the hole concentration in lightly Al-doped 4H-SiC epilayers, a shallow acceptor with E V þ 0:2 eV, which is an Al atom ðAl Si Þ at a Si sublattice site, and an unknown deep defect with E V þ 0:35 eV are found, where E V is the valence band maximum. In unirradiated