Mechanism of stress relaxation in Ge nanocrystals embedded in SiO2

✍ Scribed by Sharp, I. D.; Yi, D. O.; Xu, Q.; Liao, C. Y.; Beeman, J. W.; Liliental-Weber, Z.; Yu, K. M.; Zakharov, D. N.; Ager, J. W.; Chrzan, D. C.; Haller, E. E.

• Book ID: 118747439
• Publisher: American Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 423 KB
• Volume: 86
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1856132