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Mechanism of electrodeposition and dissolution processes of copper in aqueous solutions

โœ Scribed by Bockris, J. O'M.; Enyo, M.


Book ID
120048589
Publisher
Royal Society of Chemistry
Year
1962
Weight
890 KB
Volume
58
Category
Article
ISSN
0014-7672

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๐Ÿ“œ SIMILAR VOLUMES


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Galvanostatic single-pulse, rotating-disc and chronopotentiometric measurements on etched polycrystalline copper electrodes in semimolar mixed solutions of CuS04, MgSOL and HISO at 25ยฐC have yielded kinetic parameters and specific rate data for either of the two consecutive chargetransfer steps of t

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The cathodic deposition of Cu on Pt from DMF, ACN and MeOH solutions has been investigated by chronopotentiometric method. The electrodeposition processes are irreversible. The cathodic reactions are complicated by adsorption processes. In the presence of the Cl-ions in DMF and ACN the cathodic wave