Kinetics of copper dissolution and deposition in aqueous sulphate solution
β Scribed by T. Hurlen; G. Ottesen; A. Staurset
- Publisher
- Elsevier Science
- Year
- 1978
- Tongue
- English
- Weight
- 572 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0013-4686
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β¦ Synopsis
Galvanostatic single-pulse, rotating-disc and chronopotentiometric measurements on etched polycrystalline copper electrodes in semimolar mixed solutions of CuS04, MgSOL and HISO at 25Β°C have yielded kinetic parameters and specific rate data for either of the two consecutive chargetransfer steps of the Cu/Cu(II) electrode. The ion-trantier step Cu/Cu(I), but not the electron-transfer step Cu~)/Cu(II), depends on a surface factor for crystal growth and demolition. Some information on this factor is obtained. Comuarisons are made to the solid Ni/Ni(II) electrode and to the liquid Cu(Hg)/Cu(II) electrode. _
π SIMILAR VOLUMES
The diffusion coeficient, D, of CuSO, in aqueous solution was determined at 298.1 K by chronopotentiometry and also with a rotating disc electrode using the mixed control Levich equation. For 0 < [CuSO,] < 0.05 moldm-3,D = 17.35 &O.iS-(5.3\* l.4)[CuS0,]'~Z} x 10-'DmZs-', at a constant ionic strength
Different experimental procedures have been employed to establish the slow step in the cathodic growth of copper on freshly crystallized copper substrates. The investigation of intermediates in this electrode reaction is shown to be possible using a rotating single disk electrode. The conclusions dr
The rate of dissolution of rotating copper discs in acidified copper(H) solutions prepared in an acetonitrile-water solvent (mole fraction acetonitrile = 0.25) was measured in the temperature range 27C-360K. The rate of dissolution was found to be proportional to the square root of the rotation spee