Mechanism of contact resistance formation in ohmic contacts with high dislocation density

✍ Scribed by Sachenko, A. V.; Belyaev, A. E.; Boltovets, N. S.; Konakova, R. V.; Kudryk, Ya. Ya.; Novitskii, S. V.; Sheremet, V. N.; Li, J.; Vitusevich, S. A.

• Book ID: 115496222
• Publisher: American Institute of Physics
• Year: 2012
• Tongue: English
• Weight: 627 KB
• Volume: 111
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.3702850