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Measurement of the striking force of Ar ions on the substrate during sputter deposition of a-Si:H thin films

โœ Scribed by M.S. Aida; S. Rahmane


Book ID
108388913
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
190 KB
Volume
288
Category
Article
ISSN
0040-6090

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Sputter etching effect of the substrate
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Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese