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Mask design compensation for sloped sidewall structures fabricated by X-ray lithography

✍ Scribed by Mitsuhiro Horade; Sommawan Khumpuang; Kazuya Fujioka; Susumu Sugiyama

Publisher: Springer-Verlag
Year: 2006
Tongue: English
Weight: 387 KB
Volume: 13
Category: Article
ISSN: 0946-7076
DOI: 10.1007/s00542-006-0219-7

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