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Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology

✍ Scribed by P. Coane; R. Giasolli; S. Ledger; K. Lian; Z. Ling; J. Göttert


Publisher
Springer-Verlag
Year
2000
Tongue
English
Weight
381 KB
Volume
6
Category
Article
ISSN
0946-7076

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